Русско-англо-русский юридический словарь

Layout designs (topographies) of integrated circuits are a field in the protection of intellectual property.

In United States intellectual property law, a "mask work" is a two or three-dimensional layout or topography of an integrated circuit (IC or "chip"), i.e. the arrangement on a chip of semiconductor devices such as transistors and passive electronic components such as resistors and interconnections. The layout is called a mask work because, in photolithographic processes, the multiple etched layers within actual ICs are each created using a mask, called the photomask, to permit or block the light at specific locations, sometimes for hundreds of chips on a wafer simultaneously. (Wikipedia)

royalties receivable for the use of, or right to use in Hong Kong a patent, design, trademark, copyright, layout-design (topography) of an integrated circuit, performer's right, plant variety right, formula or other property of a similar nature; (LexisNexis)